Process for fabrication of device

Details Process for fabrication of device Process for fabrication of device

1989-07-28

1991-01-01

Dees, Jose

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430317, 430326, 430967, 430325, G03F 7075, G03F 732

Patent

active

049817701

ABSTRACT:
The use of a surface treatment approach to lithography, depending on a radiation-induced change in hydrophilicity, shows particular promise for deep UV, vacuum ultraviolet and x-ray lithography. For example, hydrophobic chlorinated polystyrene is selectively irradiated in the presence of oxygen producing local hydrophilic regions. Subsequent treatment of these hydrophilic regions with water followed by an organometallic or inorganic gas such as TiCl.sub.4 yields a patterned, surface metal oxide suitable as, for example, an etch mask for further patterning of the underlying polymer film and device regions.

REFERENCES:
patent: 4500628 (1985-02-01), Taylor
patent: 4596761 (1986-06-01), Brault
patent: 4810601 (1989-03-01), Allen et al.
Follett et al. "Polarity Reversal of PMMA by Treatment with Chlorosilanes", Extend Abstracts, 1046B, vol. 82-2, Oct. 1982.
G. N. Taylor et al., Journal of the Electrochemical Society, 131, 1659 (1984).
Semiconductor Lithography, W. Moreau, Plenum Press, New York, 1988 (Because of the Length of the Article, Only the Table of Contents are Provided).

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