Process for fabrication of bubble jet using positive resist imag

Details Process for fabrication of bubble jet using positive resist imag Process for fabrication of bubble jet using positive resist imag

1992-12-31

1994-11-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430330, 430324, 430315, 430328, 340 76PH, 298901, 347 63, G03C 500, G01D 1516

Patent

active

053647432

ABSTRACT:
In bubble jet heater dies, a photolithographic process is disclosed to form patterned photoresist structures having re-entrant angles to facilitate an improved lift-off structure for anti-cavitation layer deposition. A substrate is coated with a photoresist which includes 0.5% to 1.0% Monazoline C. When exposed to Ultra-Violet light and developed, apertures in the photoresist have inverted side walls. Anti-cavitation material, such as tantalum, is then sputtered onto the substrate and the photoresist to form patterned metal. structures. The lift-off of the patterned photoresist is easily performed leaving behind the patterned metal structures. The use of this lift-off deposition method prevents stress-cracking in the anti-cavitation layer seen in deposition and etch methods.

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