Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1991-01-11
1992-09-22
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C23C 1434
Patent
active
051494094
ABSTRACT:
In the fabrication of thi film cobalt alloy magnetic recording disks by sputter-deposition, the coercivity of the disks can be selectively varied by introducing a predetermined amount of hydrocarbon gas, such as methane, into the argon-based sputtering atmosphere. The flow rate of the hydrocarbon gas into the sputtering chamber is directly related to the coercivity of the resulting disks. This permits the coercivity of the disks to be controlled without the necessity of changing the composition of the cobalt alloy sputtering targets, and without the necessity of changing the thickness of an underlying between the disk substrate and the magnetic layer. The use of hydrocarbon gas in the reactive sputtering of the cobalt alloy magnetic layer in the disks does not affect the intrinsic media noise of the disks, thus allowing for the manufacturing of disks with high signal-to-noise ratio (SNR) of the readback signal.
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Ahlert Richard H.
Howard James K.
Lambert Steven E.
Berthold Thomas R.
International Business Machines - Corporation
Weisstuch Aaron
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