Process for fabricating silicon carbide films with a predetermin

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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427249, 4272552, 427314, B05D 306

Patent

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051621339

ABSTRACT:
The present invention relates to a process for fabricating silicon carbide films and membranes with a predetermined stress via control of the deposition parameters which comprises the following steps:

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