Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1990-12-20
1992-11-10
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427249, 4272552, 427314, B05D 306
Patent
active
051621339
ABSTRACT:
The present invention relates to a process for fabricating silicon carbide films and membranes with a predetermined stress via control of the deposition parameters which comprises the following steps:
Bartha Johann W.
Bayer Thomas
Greschner Johann
Kraus Georg
Wolter Olaf
Goodwin John L.
International Business Machines - Corporation
Pianalto Bernard
LandOfFree
Process for fabricating silicon carbide films with a predetermin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for fabricating silicon carbide films with a predetermin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for fabricating silicon carbide films with a predetermin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2291284