Process for fabricating semiconductor integrated circuit device,

Details Process for fabricating semiconductor integrated circuit device, Process for fabricating semiconductor integrated circuit device,

1997-07-17

2000-11-28

Gibson, Sharon

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430311, 430313, 430394, 430396, 2504922, G03F 700

Patent

active

061533572

ABSTRACT:
Herein disclosed is an exposure technology for a semiconductor integrated circuit device which has a pattern as fine as that of an exposure wavelength. The technology contemplates to improve the resolution characteristics of the pattern by making use of the mutual interference of exposure luminous fluxes.

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patent: 5266446 (1993-11-01), Chang et al.
patent: 5364716 (1994-11-01), Nakagawa
patent: 5670427 (1997-09-01), Cho
patent: 5736300 (1998-04-01), Mizuno
patent: 5741625 (1998-04-01), Bae

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