Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-09-28
2009-10-06
McPherson, John A (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S311000, C430S314000, C430S950000
Reexamination Certificate
active
07598023
ABSTRACT:
A process for fabricating a micro-display is provided. First, a wafer having a driving circuit thereon is provided. Then, a metallic reflective layer is formed on the wafer. Thereafter, an anti-reflection layer and a patterned photoresist layer are sequentially formed on the metallic reflective layer. Using the patterned photoresist layer as an etching mask, the anti-reflection layer and the metallic reflective layer are etched to form a trench pattern that exposes the surface of the wafer. After that, the patterned photoresist layer is removed. A dielectric layer is formed to cover the anti-reflection layer and fill the trench pattern. Then, a portion of the dielectric layer and the anti-reflection layer are removed to expose the surface of the metallic reflective layer.
REFERENCES:
patent: 6620715 (2003-09-01), Blosse et al.
patent: 2003/0040174 (2003-02-01), Tan et al.
Chen Hsuan-Hsu
Chen Shih-Hung
Cheng Chih-Hung
Tsai Chien-Hua
Tsai Huai-Hsuan
Chacko Davis Daborah
Jianq Chyun IP Office
McPherson John A
United Microelectronics Corp.
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