Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1983-11-03
1985-05-14
Smith, John D.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
1566591, 427162, G03C 500
Patent
active
045172803
ABSTRACT:
A process for making a diffraction grating pattern on a substrate is disclosed. The process comprises the steps of coating the substrate with first and second materials, with one of the materials defining a selected area for the diffraction grating pattern, and the other material covering the substrate while forming a window at that portion of the substrate where the diffraction grating is desired. The window portion of the substrate is then etched, and the first and second materials are stripped off in order to leave behind the diffraction grating pattern at the desired location of the substrate.
REFERENCES:
patent: 3961102 (1976-06-01), Ballantyne
patent: 4203649 (1980-05-01), Velasco
patent: 4241109 (1980-12-01), Johnson
patent: 4321282 (1982-03-01), Johnson
patent: 4393126 (1983-07-01), Kojima
patent: 4426440 (1984-01-01), Thompson
Heflinger "Submicron Grating Fabrication on GaAs by Holographic Exposure", Optical Engineering, vol. 21, No. 3, pp. 537-541, 5(1982).
Matsuoka Shunji
Nishiura Yozo
Nishiwaki Yoshikazu
Okamoto Kenji
Smith John D.
Sumitomo Electric Industries Ltd.
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