Process for fabricating high density disc storage device

Details Process for fabricating high density disc storage device Process for fabricating high density disc storage device

1988-10-28

1990-05-15

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427128, 427129, 427130, 427250, 4272552, 4272553, 427314, 4273741, 4273983, H01F 1002, B05D 306

Patent

active

049257005

ABSTRACT:
A process for forming chromium dioxide thin films which are receptive to high density magnetic recording. The process comprises depositing both chromium and oxygen on a substrate by evaporative techniques and concurrently bombarding the substrate with high energy ions of at least one of the film constituents to form a latent CrO.sub.x film forming layer. The process is carried out at approximately room temperature.
The as-grown latent film forming layer is subsequently heat treated by a rapid thermal anneal step which raises the temperature of the as-grown film to about 500.degree. C. The rapid thermal anneal step preferably comprises a series of at least five separte pulses over a 10-second time span. After the rapid thermal anneal, the sample is rapidly quenched to room temperature.

REFERENCES:
patent: 4634600 (1987-01-01), Shimizu et al.

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