Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1985-04-15
1986-12-30
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430323, 430331, 430495, 430942, 156643, 156646, 156652, 1566591, G03C 500
Patent
active
046328980
ABSTRACT:
The present disclosure relates to a process for fabricating glass tooling with a featured surface. The method entails the steps of coating a polished surface of a glass blank with a continuous metal coating. A photoresist is applied, exposed, and developed in a desired pattern. Uncovered metal is etched away and the remaining metal provides a mask. The uncovered glass is plasma etched to feature the surface of the glass blank.
REFERENCES:
patent: 3600243 (1971-08-01), LaRocque et al.
patent: 3794536 (1974-02-01), Muska
patent: 3957609 (1976-05-01), Sasano et al.
patent: 4275091 (1981-06-01), Lippits et al.
patent: 4374077 (1983-02-01), Kerfeld
patent: 4421593 (1983-12-01), Curtis et al.
patent: 4444869 (1984-04-01), Chonan et al.
patent: 4556628 (1985-12-01), Greschner et al.
IBM Technical Disclosure Bulletin, vol. 13, No. 2, Jul. 1970, p. 394, P. P. Castrucci et al., "Chrome Mask Fabrication by RF Sputter Etch".
Review of the Electrical Communication Laboratories, vol. 32, No. 2, "Properties of Injection-Molded Plastic Substrates for Laser Beam Memory".
Fister Robert V.
Pledger James R.
Dixon William C.
Eastman Kodak Company
Kittle John E.
Ryan Patrick J.
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