Process for fabricating glass tooling

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430323, 430331, 430495, 430942, 156643, 156646, 156652, 1566591, G03C 500

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046328980

ABSTRACT:
The present disclosure relates to a process for fabricating glass tooling with a featured surface. The method entails the steps of coating a polished surface of a glass blank with a continuous metal coating. A photoresist is applied, exposed, and developed in a desired pattern. Uncovered metal is etched away and the remaining metal provides a mask. The uncovered glass is plasma etched to feature the surface of the glass blank.

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IBM Technical Disclosure Bulletin, vol. 13, No. 2, Jul. 1970, p. 394, P. P. Castrucci et al., "Chrome Mask Fabrication by RF Sputter Etch".
Review of the Electrical Communication Laboratories, vol. 32, No. 2, "Properties of Injection-Molded Plastic Substrates for Laser Beam Memory".

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