Process for fabricating films of uniform properties on...

Details Process for fabricating films of uniform properties on... Process for fabricating films of uniform properties on...

2005-11-01

2005-11-01

Lund, Jeffrie R. (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S666000, C118S696000, C118S697000

Reexamination Certificate

active

06960264

ABSTRACT:
A process for forming a thin layer exhibiting a substantially uniform property on an active surface of a semiconductor substrate. The process includes varying the temperature within a reaction chamber while a layer of a material is formed upon the semiconductor substrate. Varying the temperature within the reaction chamber facilitates temperature uniformity across the semiconductor wafer. As a result, a layer forming reaction occurs at a substantially consistent rate over the entire active surface of the semiconductor substrate. The process may also include oscillating the temperature within the reaction chamber while a layer of a material is being formed upon a semiconductor substrate.

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