Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1998-06-04
2000-05-02
Griffin, Steven P.
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 11, 216 48, 216 63, 216 66, 216 74, 216 79, C23F 100, C25F 300, B44C 122
Patent
active
060568879
ABSTRACT:
A process for fabricating a feeler member for a micromechanical probe, in particular for an atomic force microscope, consists in creating a "positive" first mold by isotropically or anisotropically undercutting a silicon substrate. The resulting tip is precursor of the hard material (preferably diamond) tip to be obtained. The precursor has a small angle at the apex, for example in the order of 10.degree. to 20.degree., or less. The positive mold is then used to fabricate a "negative" mold having an imprint whose shape is that of the tip precursor. The negative mold is filled with a layer of hard material and the tip is then uncovered. The hard material tip therefore also has a small angle at the apex, equal to that of the precursor. The resolution that can be achieved with the probe is therefore higher than that assured by prior art probes.
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"Microfabrication of cantilever styli for the atomic force microscope", T Albrecht et al., Journal of Vacuum Science and Technology: Part A, vol. 8, No. 1, (Jul./Aug. 1990).
Beuret Cynthia
Jeanneret Sylvain
Niedermann Philipp
C.S.E.M. - Centre Suisse d'Electronique et de Microtechniques S.
Griffin Steven P.
Nave Eileen E.
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