Process for exposing a photosensitive resin composition to light

Details Process for exposing a photosensitive resin composition to light Process for exposing a photosensitive resin composition to light

1991-06-04

1994-07-19

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Processing feature prior to imaging

522 4, 522913, G03C 500

Patent

active

053308824

ABSTRACT:
The present invention provides an improved process by which dissolved oxygen is effectively removed from a photosensitive resin layer of a photosensitive resin plate. The process comprises preliminarily exposing the photosensitive resin to light to quench oxygen dissolved in said photosensitive resin layer before conducting a main exposure. The photosensitive resin layer is prepared from a photosensitive resin composition which comprises:

REFERENCES:
patent: 4716097 (1981-12-01), Weed
patent: 4978604 (1990-12-01), Banks et al.
Decker et al., Photographic Science and Engineering, vol. 23, No. 3, 137-140 (1979).

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