Process for etching via holes in alumina

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156637, 156655, 1566591, 156667, 252 795, B44C 122, C03C 1500, C03C 2506

Patent

active

046197311

ABSTRACT:
Via holes are etched in an alumina layer using an etchant bath of ethylenediaminetetraacetic acid at a pH above 9.

REFERENCES:
patent: 3923559 (1975-12-01), Sinha
patent: 4251621 (1981-02-01), Fraley et al.
patent: 4339281 (1982-07-01), Chio
patent: 4461818 (1984-07-01), Suzuki et al.

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