Process for etching nonphotosensitive layer under washoff photop

Details Process for etching nonphotosensitive layer under washoff photop Process for etching nonphotosensitive layer under washoff photop

1984-07-27

1986-04-22

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Readily visible image formation

430 6, 430273, 430323, 430325, 430331, 430300, 430277, G03C 516, G03F 100, G03C 171, G03F 700

Patent

active

045842612

ABSTRACT:
Process for preparation of dot-etched, photopolymerizable lithographic film which comprises (a) exposing imagewise a photopolymerizable element consisting essentially of a support and two caustic or water soluble layers, the upper layer being clear, unpigmented photopolymer and the lower layer being a polymeric binder having dispersed therein a chemically soluble pigment, e.g., colloidal silver or other metal; and optionally an overcoat layer; developing the exposed element with caustic solution and then water; and treating the developed image with a solubilizing agent, e.g., K.sub.2 Fe(CN).sub.6, FeCl.sub.3,Na.sub.2 S.sub.2 O.sub.3, KCNS, KOH, NH.sub.3, etc. A dot-etched lithographic film is prepared.

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patent: 4094679 (1978-06-01), Washizawa et al.
patent: 4138262 (1979-02-01), Wacks et al.
patent: 4357416 (1982-11-01), Fan
patent: 4472494 (1984-09-01), Hallman et al.

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