Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1991-02-20
1992-05-05
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156646, 156656, 156657, 1566591, 156345, 20419237, 252 791, 437233, 437245, H01L 21306, B44C 122, C23F 102, C03C 1500
Patent
active
051104083
ABSTRACT:
The present invention relates to the etching of a gate film, a tungsten film, a silicon film, etc. In the present invention, use is made of an etching gas comprising a mixture composed of a reductive fluoride gas, a hydrocarbon gas and a halogen gas having a larger atomic diameter than a material to be etched, or a mixture composed of a reductive fluoride gas and a Cl-containing hydrocarbon gas, and the process comprises the step of conducting anisotropic etching of a material to be etched with an etching gas (a reductive fluoride gas), the step of forming a protective film by a depositing gas (a hydrocarbon gas), and the step of removing excess deposits formed as the protective film by means of a gas reactive with the protective film (a halogen gas or a Cl-containing hydrogen gas), wherein anisotropic etching is conducted by forming a protective film on a side wall while removing excess deposits formed as the protective film, thus enabling the anisotropic etching to be conducted with good accuracy.
REFERENCES:
patent: 4473435 (1984-09-01), Zaffropoulo et al.
patent: 4713141 (1987-12-01), Tsang
patent: 4741799 (1988-05-01), Chen et al.
Fujii Takashi
Kawahara Hironobu
Nishiumi Masaharu
Takata Kazuo
Yamamoto Noriaki
Hitachi , Ltd.
Powell William A.
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