Process for digging a deep trench in a semiconductor body...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step

Reexamination Certificate

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C438S689000, C257S622000, C257SE21553

Reexamination Certificate

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07544620

ABSTRACT:
A process for digging deep trenches in a body of semiconductor material includes forming a mask having an opening, above a surface of a semiconductor body. A passivating layer is conformally formed on the mask and on the semiconductor body within the opening. A directional etch is extended to first remove the passivating layer from on top of the semiconductor body and then etch the semiconductor body through the opening. Forming the passivating layer and executing the directional etch are carried out repeatedly in sequence so as to form a trench through the opening. A tapered portion of the trench is formed, which has a transverse dimension decreasing as a distance from the surface of the semiconductor body increases.

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European Search Report, EP 05425930, May 10, 2006.

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