Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making printing plates
Patent
1992-04-20
1994-03-01
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making printing plates
430272, 430278, 430284, 430288, 430309, 430331, G03F 730, G03F 732, G03F 7035
Patent
active
052906655
ABSTRACT:
Disclosed is a process for developing a presensitized plate which is used in making a lithographic printing plate requiring no dampening water and which comprises, on a substrate, a photopolymerizable adhesive layer and a silicone rubber layer in the order, said process comprising water as a main component and at least one ethylene glycol derivative represented by the following general formula (I):
REFERENCES:
patent: 3996054 (1976-12-01), Santemma et al.
patent: 4130425 (1978-12-01), Boyd
patent: 4416976 (1983-11-01), Schell
patent: 4535054 (1985-08-01), Brault et al.
patent: 4587203 (1986-05-01), Brault et al.
patent: 4690886 (1987-09-01), Naritomi et al.
patent: 4743527 (1988-05-01), Yoshida et al.
patent: 4959296 (1988-12-01), Yoshida et al.
patent: 4963472 (1990-10-01), Schlosser et al.
patent: 5230989 (1993-07-01), Urabe et al.
Kii Mashafumi
Takahashi Hiroshi
Uraba Yoshihiko
Yoshida Susumu
Bowers Jr. Charles L.
Chu John S.
Fuji Photo Film Co. , Ltd.
LandOfFree
Process for developing PS plate requiring no dampening water whe does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for developing PS plate requiring no dampening water whe, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for developing PS plate requiring no dampening water whe will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-576107