Process for developing light-sensitive o-quinonediazide lithogra

Details Process for developing light-sensitive o-quinonediazide lithogra Process for developing light-sensitive o-quinonediazide lithogra

1983-12-28

1986-08-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430191, 430192, 430165, 430309, 430326, G03F 708

Patent

active

046069950

ABSTRACT:
A developing solution for developing a light-sensitive lithographic plate having a o-quinonediazide compound-containing light-sensitive layer is disclosed. The developing solution is comprised of an aqueous solution containing alkali silicate and an alkali aqueous solution-soluble compound of a metal selected from the group consisting of Sn, Pb, Fe, Co and Ni. The developing solution provides excellent resolving power, has excellent development stability, processing capability and adaptability with respect to automatic developing machines.

REFERENCES:
patent: 3201241 (1965-08-01), Munder et al.
patent: 3615480 (1971-10-01), Lam
patent: 3970458 (1976-07-01), Bissonette
patent: 4292388 (1981-09-01), Ikeda et al.
patent: 4292395 (1981-09-01), Wada et al.
patent: 4314022 (1982-02-01), Fisch
patent: 4374920 (1983-02-01), Wanat et al.
patent: 4469776 (1984-09-01), Matsumoto et al.

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