Process for developing exposed diazo negative-working reproducti

Details Process for developing exposed diazo negative-working reproducti Process for developing exposed diazo negative-working reproducti

1983-12-28

1986-04-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430149, 430158, 430159, 430160, 430161, 430175, 430176, 430275, 430276, 430278, 430309, 430331, 430325, G03F 708, G03F 726, G03C 534

Patent

active

045798117

ABSTRACT:
Disclosed is a developer composition for exposed, light-sensitive, negative-working reproduction layers, which may contain an organic binder, comprising water and a salt of a substituted aromatic carboxylic acid, in particular, from about 5 to 60% by weight of at least one salt of an aromatic carboxylic acid having substituents which are immediately adjacent to the carboxyl group and represent an amino group, a hydroxyl group, and/or chlorine or bromine. Also disclosed is a process for developing the reproduction layers utilizing the disclosed developers, wherein the reproduction layer contains, in particular, a polymeric organic binder with an acetal, anhydride, amide and/or a carboxyl group.

REFERENCES:
patent: 3201241 (1965-08-01), Munder et al.
patent: 3867147 (1975-02-01), Teuscher
patent: 3891439 (1975-06-01), Katz et al.
patent: 4147545 (1979-04-01), Rowe et al.
patent: 4287297 (1981-09-01), Ishihara et al.
patent: 4329422 (1982-05-01), Langlais
patent: 4350756 (1982-09-01), Burch et al.

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