Process for depositing oxide film on metallic substrate by heat

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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427 62, 427118, 4272557, 427318, 4274192, 427585, 505325, 505477, 505480, 505500, 505741, 505819, B05D 306

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054533066

ABSTRACT:
The generation of a reaction product is suppressed between a metallic substrate and plasma in depositing a ceramic intermediate layer on the metallic substrate in a process for depositing an oxide film on the metallic substrate by thermal plasma flash evaporation method. Thus, there is no reaction phase in the ceramic intermediate layer and the metallic substrate, and an intermediated buffer layer of only oxide ceramic is deposited on a flat surface of the metallic substrate. The intermediate ceramic layer is deposited in inert atmosphere of a low oxygen concentration at a temperature of less than 600.degree. C. for the metallic substrate. Then, a superconducting thin film is deposited on the ceramic intermediate layer.

REFERENCES:
Kumar et al. "Synthesis of Superconducting YBa.sub.2 Cu.sub.3 O.sub.7 --Thin Films on Nickel Based Superalloy Using In Situ Pulsed Laser Deposition" Appl. Phys. Lett. vol. 52, No. 24, (Dec. 1990).
Kumar et al. "Enhancement in Critical Current Density of YBa.sub.2 Cu.sub.3 O.sub.7 --Thin Films on Hastelloy With Tin Buffer Layers" Appl. Phys. Lett. vol. 61, No. 8 (Aug. 1992).
Y. Iijima et al. "In-Plane Aligned YBa.sub.2 Cu.sub.3 O.sub.7-x Thin Films Deposited on Polycrystalline Metallic Substrates" Appl. Phys. Lett. vol. 60, No. 6 (Feb. 1992).
N. Tatsumi et al. "Synthesis of Superconducting Oxide Film on Metal Substrate by Radio Frequency Plasma Flash Evaporation" (no date).
Y. Iijima et al. "Biaxially Aligned YSZ Buffer Layer on Polycrystalline Substrates" Proceedings of ISS '91 (no month available).
Y. Watanabe "Growth of InAs on EuBa.sub.2 Cu.sub.3 O.sub.7-y Superconducting Thin Films with SrF2 Interlayers" Appl. Phys. Lett. vol. 8, No. 24 (Aug. 1992).

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