Process for depositing Cr-bearing layer

Details Process for depositing Cr-bearing layer Process for depositing Cr-bearing layer

1994-07-12

1995-05-09

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427180, 427249, 427252, 4272553, 427256, 427577, B05D 306

Patent

active

054138213

ABSTRACT:
A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate.

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