Process for depositing adherent diamond thin films

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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427575, 427573, 427249, 427109, 427299, B05D 306, C23C 1626

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058979247

ABSTRACT:
A process for depositing an adherent polycrystalline diamond thin film on a glass substrate, by chemical vapor deposition (CVD) at 1 to 15 torr and low temperatures of the substrate of between about 350 to 600.degree. C. using hydrogen and methane and optionally carbon dioxide. The substrate has diamond particles deposited on it or is polished with diamond particles prior to CVD. The process produces films which are clear and adherent.

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