Process for depositing adherent diamond thin films

Details Process for depositing adherent diamond thin films Process for depositing adherent diamond thin films

1997-03-28

1999-04-27

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427575, 427573, 427249, 427109, 427299, B05D 306, C23C 1626

Patent

active

058979247

ABSTRACT:
A process for depositing an adherent polycrystalline diamond thin film on a glass substrate, by chemical vapor deposition (CVD) at 1 to 15 torr and low temperatures of the substrate of between about 350 to 600.degree. C. using hydrogen and methane and optionally carbon dioxide. The substrate has diamond particles deposited on it or is polished with diamond particles prior to CVD. The process produces films which are clear and adherent.

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