Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1978-12-01
1982-06-01
Lusignan, Michael R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
427 431, 427 44, 427 541, 427 86, 427 87, 427 96, 427 99, 4271261, 427226, 427229, 4272481, 427255, 4272554, 427256, 427271, 427272, 427273, 427282, 427164, 427165, 427166, 430270, 430302, 430311, 430321, 430322, 430330, B05D 506, B05D 306, B05D 512
Patent
active
043328792
ABSTRACT:
The specification describes a process for depositing a film of controlled composition on a substrate by using a metallo-organic photoresist in which the organic portion is combusted by heating in a reactive atmosphere to leave a residual deposit of a desired substance on the substrate. The film may be formed as a patterned or unpatterned layer. In addition, the residual deposit may be subsequently subjected to a chemical reaction to alter its composition.
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Condensed Chemical Dictionary, 6th ed., Rheinhold, N.Y., 1961, p. 195.
Pastor Antonio C.
Pastor Ricardo C.
Tangonan Gregory L.
Wong Shi-Yin
Bell Janyce A.
Hughes Aircraft Company
Lachman Mary E.
Lusignan Michael R.
MacAllister W. H.
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