Process for depositing a carbon-rich coating on a moving substra

Details Process for depositing a carbon-rich coating on a moving substra Process for depositing a carbon-rich coating on a moving substra

1996-11-05

1999-03-30

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427249, 4272555, 427122, B05D 306, C23C 1626, C23C 1650

Patent

active

058885943

ABSTRACT:
A process and apparatus for deposition of a carbon-rich coating onto a moving substrate is provided. The process and apparatus involve the creation of an electric field surrounding a rotatable electrode in a carbon-containing gaseous environment. This results in carbon-rich plasma formation, wherein the electrode is negatively biased with respect to the electrode which results in ion acceleration from the plasma toward the electrode. Ion bombardment continuously occurs on a substrate in contact with the electrode producing a continuous carbon-rich coating over the length of the substrate.

REFERENCES:
patent: 4479982 (1984-10-01), Nilsson et al.
patent: 4645977 (1987-02-01), Kurokawa et al.
patent: 4663640 (1987-05-01), Ikeda
patent: 4847639 (1989-07-01), Sugata et al.
patent: 4865711 (1989-09-01), Kittler
patent: 4890126 (1989-12-01), Hotomi
patent: 5073785 (1991-12-01), Jansen et al.
patent: 5094878 (1992-03-01), Yamamoto et al.
patent: 5182132 (1993-01-01), Murai et al.
patent: 5203924 (1993-04-01), Mitani et al.
patent: 5224441 (1993-07-01), Felts et al.
patent: 5227008 (1993-07-01), Klun et al.
patent: 5232791 (1993-08-01), Kohler et al.
patent: 5286534 (1994-02-01), Kohler et al.
patent: 5360483 (1994-11-01), Kurokawa et al.
patent: 5443687 (1995-08-01), Koyama et al.
patent: 5443888 (1995-08-01), Murai et al.
patent: 5464667 (1995-11-01), Kohler et al.
patent: 5496595 (1996-03-01), Ueda et al.
patent: 5695832 (1997-12-01), Hirano et al.
David, M. et al., "Plasma Deposition and Etching of Diamond-Like Carbon Films," AIChE Journal, vol. 37, No. 3, pp. 367-376 (Mar., 1991).
Logan, J., "RF Diode Sputter Etching and Deposition, " Handbook of Plasma Processing Technology-Fundamentals, Etching, Deposition, and Surface Interactions, Part III, Ch. 5, Noyes Publications, Park Ridge, NJ, pp. 140-159 (1990).

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