Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-06-23
1991-03-05
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419226, C23C 1434
Patent
active
049975382
ABSTRACT:
A cathodic sputtering operation using a target of a material containing titanium, aluminum, oxygen and nitrogen in an argon atmosphere is disclosed.
This sputtering operation gives rise to a layer containing the same elements as the target. The resulting layer is opaque, has an attractive, deep and brilliant black color, adheres well to the substrate and is resistant to wear and corrosion.
REFERENCES:
patent: 4098956 (1978-07-01), Blickensderfer et al.
patent: 4634635 (1987-01-01), Shiraishi
patent: 4758280 (1988-07-01), Bergmann et al.
Wear Resistant Ti-Al-C-N-O Films Produced by Sputtering, O. Knotek et al., Report of 8th International Congress on Vacuum Metallurgy in Linz, Austria in 1985 European Search Report, Oct. 2, 1989.
Levy Francis
Luthier Roland
Mocellin Alain
Asulab S.A.
Leader William T.
Niebling John F.
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