Process for defining resist patterns

Details Process for defining resist patterns Process for defining resist patterns

1996-03-26

1998-12-22

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430394, 430396, G03F 720

Patent

active

058517340

ABSTRACT:
A process for forming patterns in resist material on a semiconductor wafer that uses two masks to define a pattern instead of a single conventional mask to define the pattern. The present invention realizes better process latitude and resolution for a given feature size than did the prior art.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5194345 (1993-03-01), Rolfson
patent: 5194346 (1993-03-01), Rolfson et al.
patent: 5281500 (1994-01-01), Cathey et al.
patent: 5308722 (1994-05-01), Nistler
patent: 5308741 (1994-05-01), Kemp

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