Process for coating substrates made of a transparent material, f

Details Process for coating substrates made of a transparent material, f Process for coating substrates made of a transparent material, f

1989-07-10

1991-02-05

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

204192260, C23C 1434

Patent

active

049902342

ABSTRACT:
Process for coating transparent substrates, for example float glass, with a transparent dielectric layer having a low refractive index (n<1.7) at a high layer growth rate (>6.0A cm.sup.2 /W sec) by means of reactive direct current cathode sputtering. A vacuum chamber includes a cathode 5 which is provided on one of its surfaces with the material (target) to be sputtered and deposited on the substrate 3. The material to be sputtered (target) is a silicide, preferably nickel disilicide (NiSi.sub.2), and the layer deposited on the substrate is the corresponding oxide, for example NiSi-oxide. The reactive gas introduced into the vacuum chamber is oxygen and the process gas is a noble gas.

REFERENCES:
patent: 4769291 (1988-09-01), Belkind et al.

Affiliated with

Also associated with

Rating

Process for coating substrates made of a transparent material, f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for coating substrates made of a transparent material, f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for coating substrates made of a transparent material, f will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-8918