Process for coating a substrate using a pulsed laser beam

Details Process for coating a substrate using a pulsed laser beam Process for coating a substrate using a pulsed laser beam

1991-07-16

1993-05-11

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427582, 21912162, 21912185, B05D 512, B05D 306, B23K 2604, B23K 2600

Patent

active

052099440

ABSTRACT:
In order to so improve a process for the manufacture of a layer on a substrate wherein by means of a pulsed laser beam a coating material is ablated from a carrier, transported in the form of a current of particles to the substrate and deposited on the latter to form the layer, that it is suitable for the manufacture of thin precision layers, preferably in a defined number of atom layers, as is, for example, required in the manufacture of semiconductors, it is proposed that the layer be manufactured as thin precision layer by pulse duration and pulse intensity of the laser beam being selected such that ionization and heating-up of the coating material take place essentially only in the zone of interaction of the laser light with the coating material so the stream of particles is formed as cluster-free plasma containing single, non-coherent ions or atoms.

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patent: 4987007 (1991-01-01), Wagal et al.
patent: 5015492 (1991-05-01), Venkatesan et al.
patent: 5019552 (1991-05-01), Balooch et al.
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patent: 5084300 (1992-01-01), Zander et al.
patent: 5094880 (1992-03-01), Hongoh
patent: 5097793 (1992-03-01), Shuhara et al.
patent: 5126165 (1992-06-01), Akihama et al.
patent: 5145713 (1992-09-01), Venkatesan et al.

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