Process for cleaning semi-conductor discs

Details Process for cleaning semi-conductor discs Process for cleaning semi-conductor discs

1977-11-21

1979-05-29

Caroff, Marc L.

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 26, 134 28, 134 30, 134 37, 134 40, B08B 308, B08B 500

Patent

active

041566190

ABSTRACT:
Semi-conductor discs are cleaned, after being subjected to a polishing operation, by immersing the discs in a solution of about 30-100% by weight non-ionic or anionic surfactant and thereafter rinsing the discs with water.

REFERENCES:
patent: 2419237 (1947-04-01), Treuting
patent: 3205555 (1965-09-01), Balde et al.
patent: 3342652 (1967-09-01), Reisman et al.
patent: 3582401 (1971-06-01), Berilla et al.
patent: 3585668 (1971-06-01), Jaccodine et al.
patent: 3607478 (1971-09-01), Henninges et al.
patent: 3664872 (1972-05-01), Frank et al.
patent: 3850721 (1974-11-01), Schubert
patent: 3970471 (1976-07-01), Bankes et al.
patent: 3988256 (1976-10-01), Vandermey et al.
Meek et al., J. Electrochem. Soc., "Silicon Surface Contamination: Polish and Cleaning", 9-1973, pp. 1241-1242.

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