Process for cleaning copper-containing metal surfaces

Details Process for cleaning copper-containing metal surfaces Process for cleaning copper-containing metal surfaces

1982-06-23

1983-04-12

Smith, John D.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

134 2, 134 3, 204 15, 427 98, 427327, 430331, G03C 524

Patent

active

043798349

ABSTRACT:
A process and an aqueous treatment solution for cleaning copper surfaces, in particular for removing residues of photoresist layers, which residues still adhere after development to the cleared copper areas, are described. The solution contains a water-soluble aliphatic sulfonic acid having 8 to 30 carbon atoms or a water-soluble salt thereof.

REFERENCES:
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patent: 3166444 (1965-01-01), Ehren et al.
patent: 3847663 (1974-11-01), Shumaker
patent: 3915633 (1975-10-01), Ramachandkan
patent: 3930865 (1976-01-01), Faust et al.
patent: 4046620 (1977-09-01), Andrascek et al.
patent: 4088498 (1978-05-01), Faust
patent: 4165295 (1979-08-01), Vander Mey

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