Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1996-08-29
1999-03-30
Niebling, John F.
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438666, 438926, 257773, H01L 21441
Patent
active
058888934
ABSTRACT:
In a process for arranging printed conductors on the surface of a semiconductor component, distances from the first forbidden zones are maintained. This is accomplished by converting the first forbidden zones to second forbidden zones by enlargement, where the zones are enlarged in the x and y directions by a different factor than in the a and b directions. Then paths are produced outside of or at the edge of the second forbidden zones for the arrangement of printed conductors.
REFERENCES:
patent: 5228951 (1993-07-01), Pradel
patent: 5494853 (1996-02-01), Lur
patent: 5654221 (1997-08-01), Cronin et al.
Ioannis G. Tollis; Wiring In Uniform Grids and Two-Colorable Maps; Integration; 1991; pp. 189-210.
Roedel Carsten
Scheible Juergen
Nguyen Ha Tran
Niebling John F.
Robert & Bosch GmbH
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