Process for analyzing charged particles

Details Process for analyzing charged particles Process for analyzing charged particles

1978-02-17

1980-02-19

Anderson, Bruce C.

Radiant energy

Ionic separation or analysis

Methods

250284, D01D 5944, H01J 3934

Patent

active

041896394

ABSTRACT:
A process for analyzing charged particles wherein charged particles are impinged on a film of resist which is made of polymethylmethacrylate sensitive to charged particles, the resist film is dissolved and the mass of charged particles impinged is measured in terms of the dissolved resist or the resist left.

REFERENCES:
patent: 3510646 (1970-05-01), Briggs et al.
"Analysis of Semiconductor Surfaces by Spark Source Mass Spectrometry," Clegg et al., ACTA Elect. 18, 1, 1975, pp. 27-32.
"Review of Recent Advances in the Applications of Spark Source Mass Spectrometry," Bingham et al., Lab. Practice, Apr. 1975, pp. 233-238.
"Secondary Ion Mass Spectrometry and It's Application to Thin Film and Surface Analysis," Werner, ACTA Elect., 18, 1, 1975, pp. 51-62.

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