Process compensation for step and scan lithography

Details Process compensation for step and scan lithography Process compensation for step and scan lithography

2007-10-30

2007-10-30

Punnoose, Roy M. (Department: 2886)

Optics: measuring and testing

Focal position of light source

Reexamination Certificate

active

10989684

ABSTRACT:
A method of process variation compensation in step-and-scan lithography which comprises estimating a magnitude of a process error over a full imaged substrate surface and applying error correction during scan exposure over the full imaged substrate surface is provided in the disclosed embodiments.

REFERENCES:
patent: 6761362 (2004-07-01), Noguchi
patent: 2003/0086081 (2003-05-01), Lehman
“The Development of Step and Scan,” Lithography Resource, Henley PUblishing Ltd., printed Sep. 7, 2004, 5 pgs.

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