Coating apparatus – Gas or vapor deposition
Patent
1999-03-31
2000-10-17
Beck, Shrive
Coating apparatus
Gas or vapor deposition
156345, 73715, C23C 1600, H05H 100, G01L 1900
Patent
active
061325139
ABSTRACT:
A manometer resistant to chemical change caused by process chemistry used in a plasma processing chamber is provided. The manometer includes a pressure sensitive diaphragm attached to a housing wherein at least a portion of the pressure sensitive diaphragm is rendered resistant to chemical change caused by process chemistry.
REFERENCES:
patent: 4657617 (1987-04-01), Johnson et al.
patent: 5712428 (1998-01-01), Schleiferbock
patent: 5763769 (1998-06-01), Kluzner
Fischer Andreas
Kadkhodayan Babak
Sheng Tienyu T.
Tomasch Gregory A.
Beck Shrive
Hassanzadeh Parviz
Lam Research Corporation
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