Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-02-28
2010-11-23
Cleveland, Michael (Department: 1712)
Coating apparatus
Gas or vapor deposition
C118S719000, C118S728000, C118S729000
Reexamination Certificate
active
07837796
ABSTRACT:
A process chamber1for PECVD (Plasma Enhanced Chemical Vapor Deposition) coating of a substrate includes an electrode, which is integrated in a contact frame, which is firmly connected to the recipient. A movable carrier in the process chamber carries at least one substrate. The carrier is transported by means of a driven roller positioner into the process chamber or out of the process chamber along a transport route defined by the movement. As soon as the carrier inside the recipient has reached a certain position, the lower roller positioner is uncoupled from carrier by lowering by means of a lifting device. In this regard, the carrier detaches itself from the upper roller positioner. Then, the carrier is accepted by a transfer device (not shown) and brought from the transport position laterally into a treatment position in contact with the contact frame. In this way, reliable contact is produced between the electrode and a counter-electrode provided in carrier. At the same time, other carriers, in so far as the contact frame is removed laterally far enough from the transport route, during the coating of the carrier, can be moved past this.
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Haberkorn Edgar
Henrich Juergen
Schaefer Michael
Applied Materials Inc.
Chen Keath T
Cleveland Michael
Townsend and Townsend / and Crew LLP
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