Process and device for coating a substrate surface with vaporize

Details Process and device for coating a substrate surface with vaporize Process and device for coating a substrate surface with vaporize

1997-10-28

1999-03-23

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118726, C23C 1400

Patent

active

058853570

ABSTRACT:
In a process for coating a substrate surface with a layer of inorganic material, the inorganic material is vaporised in a vacuum chamber evacuated to at least 10.sup.-3 mbar by bombarding with an electron beam from a high voltage electron-beam gun and deposited on the substrate surface. Gas discharging is created between the point of incidence (A) of the electron beam on the inorganic material to be vaporised and an anode such that the electrostatic charge created by the high voltage electron-beam gun flows off via the anode. This way damage to the substrate, which may arise as a result discharging phenomena, can be effectively avoided.

REFERENCES:
Thin Solid Films, Bd. 256, Nr. 1/02, Feb. 1, 1995, Seiten 124-135, Kajioka H et al.

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