Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-10-06
1999-06-22
Letscher, Geraldine
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430332, 430333, 430335, 430336, 430340, 430343, 430346, 430348, G03C 1492, G03C 1494, G03C 176
Patent
active
059142138
ABSTRACT:
A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group to form a cation which electrophilically adds to an unsaturated reagent bearing a proton at the site of addition and a proton-containing nucleophilic grouping at an adjacent site, following which said proton on the reagent is lost and the second leaving group is displaced by said nucleophilic grouping, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.
REFERENCES:
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3932514 (1976-01-01), Thelen et al.
patent: 4345017 (1982-08-01), Cournoyer et al.
patent: 4602263 (1986-07-01), Borrer et al.
patent: 4720449 (1988-01-01), Borrer et al.
patent: 4826976 (1989-05-01), Borrer et al.
patent: 4992571 (1991-02-01), Fukuyama et al.
patent: 5055376 (1991-10-01), Saeva
patent: 5153104 (1992-10-01), Rossman et al.
patent: 5153105 (1992-10-01), Sher et al.
patent: 5219703 (1993-06-01), Bugner et al.
patent: 5258274 (1993-11-01), Helland et al.
patent: 5286612 (1994-02-01), Telfer
patent: 5314795 (1994-05-01), Helland et al.
patent: 5334489 (1994-08-01), Grasshoff et al.
patent: 5395736 (1995-03-01), Grasshoff et al.
patent: 5401619 (1995-03-01), Boggs et al.
patent: 5422230 (1995-06-01), Boggs et al.
patent: 5441850 (1995-08-01), Marshall et al.
patent: 5445917 (1995-08-01), Grasshoff et al.
patent: 5451478 (1995-09-01), Boggs et al.
patent: 5453345 (1995-09-01), Grasshoff et al.
patent: 5534388 (1996-07-01), Grasshoff et al.
patent: 5534393 (1996-07-01), Boggs et al.
patent: 5578424 (1996-11-01), Grasshoff et al.
patent: 5582956 (1996-12-01), Ehret et al.
patent: 5631118 (1997-05-01), Gaudiana et al.
patent: 5667943 (1997-09-01), Boggs et al.
patent: 5763134 (1998-06-01), Busman et al.
Crivello et al., J. Polym. Sci., Polym. Chem. Ed., 16, 2441 (1978).
Davies et al., Tetrahedron, 18, 751 (1962).
Devoe et al., Can. J. Chem., 66, 319 (1988).
Gabisch, J. Org. Chem. 26, 4165 (1961).
Hirata et al., J. Org. Chem. 36, 412 (1971).
Ito et al., Polymer Sci. Eng., 23(18), 1012 (1983).
Krohnke, Synthesis, 1976, 1.
Mitchell, R.D. et al., J. Imag. Sci., 30(5), 215 (1986).
Ohe, Y. et al., J. Imag. Sci. Tech., 37(3), 250 (1993).
Reichmanis et al., Chemical Amplification Mechanism for Microlithography, Chem. Mater., 3(3), 394 (1991).
Story, J. Org. Chem., 26, 287 (1961).
Wallraff, G.M. et al., J. Imag. Sci. Tech., 36(5), 468 (1992).
Boggs Roger A.
Grasshoff Jurgen M.
Kolb Eric S.
Marshall John L.
Minns Richard A.
Cole David J.
Letscher Geraldine
Polaroid Corporation
LandOfFree
Process and composition for generation of acid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and composition for generation of acid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and composition for generation of acid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1707544