Process and apparatus for producing a functional structure of a

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

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427597, 216 65, 148DIG93, H01L 21268

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057364648

ABSTRACT:
In order to improve a process and an apparatus for producing a functional structure of a semiconductor component, which comprises layers arranged on a base substrate and defining the entire functions of the semiconductor component, such that the functional structure of the semiconductor components can be produced as simply as possible and with as little susceptibility as possible with respect to the quality of the semiconductor components it is suggested that all the layers be produced without lithography and applied to the base substrate one after the other exclusively with physical layer application processes.

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