Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent
1995-05-25
1998-04-07
Nguyen, Nam
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
427597, 216 65, 148DIG93, H01L 21268
Patent
active
057364648
ABSTRACT:
In order to improve a process and an apparatus for producing a functional structure of a semiconductor component, which comprises layers arranged on a base substrate and defining the entire functions of the semiconductor component, such that the functional structure of the semiconductor components can be produced as simply as possible and with as little susceptibility as possible with respect to the quality of the semiconductor components it is suggested that all the layers be produced without lithography and applied to the base substrate one after the other exclusively with physical layer application processes.
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Deutsche Forschungsanstalt fuer Luft-und Raumfahrt e.V.
Hoppin Ralph F.
Lipsitz Barry R.
Nguyen Nam
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