Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2006-03-21
2006-03-21
Chen, Bret (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S570000, C427S595000, C118S7230EB, C118S7230FE
Reexamination Certificate
active
07014889
ABSTRACT:
Plasma deposition apparatus (1) and method that allows metal or nonmetal vapor (6) to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense directed gas and vapor stream at working pressures above about 0.0001 mbar using a hollow cathode plasma arc discharge (11), and conveys the ionized vapor and/or gas stream towards the substrate (4) for impact on the surface at energies varying from thermal levels (as low as about 0.05 eV) up to about 300 eV.
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Schiller, Morgner, Schiller and Straach, High Rate Coating of Plastic Films and Plastic Sheets with Clear Oxide Layers, Metallized Plastics 5&6: Fundamental and Applied Aspects, p. 75-84 [corresponding pp. 1-9 herein attached].
Groves James F.
Hass Derek D.
Mattausch Goesta
Morgner Henry
Schiller Siegfried
Chen Bret
Decker Robert J.
University of Virginia Patent Foundation
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