Process and apparatus for making fine-scale patterns

Details Process and apparatus for making fine-scale patterns Process and apparatus for making fine-scale patterns

1980-01-16

1981-11-03

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3706

Patent

active

042988039

ABSTRACT:
In a process for projecting or irradiating a pattern on a resist film or the like on a substrate such as a semiconductive wafer, the entire area of the resist film is subjected to a pre-exposure at an intensity less than a sensitivity or a critical exposure level of the resist film at which the resist at a selected (exposed or unexposed) area may be completely dissolved away and then a desired pattern is projected or irradiated on the pre-exposed resist film. These steps may be reversed. In both cases, the apparent sensitivity of the resist film may be improved so that the pattern making time may become very short. An apparatus for carrying out the above process is also disclosed.

REFERENCES:
patent: 3360784 (1967-12-01), Gaynor et al.
patent: 3556790 (1971-01-01), Rust
patent: 4007047 (1977-02-01), Kaplan et al.

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