Process and apparatus for dry cleaning by photo-excited radicals

Details Process and apparatus for dry cleaning by photo-excited radicals Process and apparatus for dry cleaning by photo-excited radicals

1991-08-08

1993-01-12

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 156643, 156646, 156656, 156657, 156662, 156345, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

051787210

ABSTRACT:
In a photo-excited dry cleaning with a halogen, a highly efficient radical generation can be obtained while selecting a cleaning gas or reaction gas pressure appropriate for removing contaminants from a substrate to be cleaned. This can be attained by controlling a light transmission distance or a distance from a window of a cleaning chamber through which a light enters the cleaning chamber to the substrate.

REFERENCES:
patent: 2841477 (1958-07-01), Hall
patent: 4885047 (1989-12-01), Ury et al.
patent: 4987008 (1991-01-01), Yamazaki et al.

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