Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-11-04
2010-10-26
McDonald, Rodney G (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S192150, C204S192160, C204S192230
Reexamination Certificate
active
07820018
ABSTRACT:
A process and apparatus for applying an optical coating to a substrate, wherein a transition layer12, which is used to match mechanical properties of a substrate10to mechanical properties of a layer system16to be applied upon the transition layer12, is deposited on a front surface20of the substrate10. For this purpose, during a sputtering process carried out in a vacuum chamber18, reaction products14are incorporated at least virtually exclusively in the transition layer12on the substrate. This prevents other surfaces of the vacuum chamber18and the rear side34of the substrate10from being contaminated with the reaction products14and/or their precursors.
REFERENCES:
patent: 3537973 (1970-11-01), Laib
patent: 4737379 (1988-04-01), Hudgens et al.
patent: 6277507 (2001-08-01), Anzaki et al.
patent: 2005/0040034 (2005-02-01), Landgraf et al.
patent: 1 092 787 (2001-04-01), None
patent: 2001073130 (2001-03-01), None
patent: WO 03/048406 (2003-06-01), None
Deposition of Gold-Containing Siloxane Thin Films, F. Fracassi et al., Elsevier Science S.A., 1996, pp. 60-63.
Alston & Bird LLP
McDonald Rodney G
Satisloh AG
LandOfFree
Process and apparatus for applying optical coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and apparatus for applying optical coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for applying optical coatings will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4184179