Probe for slurry gas sampling

Details Probe for slurry gas sampling Probe for slurry gas sampling

1998-08-04

2000-02-08

Raevis, Robert

Measuring and testing

Sampler, sample handling, etc.

With constituent separation

G01N 100

Patent

active

060216794

ABSTRACT:
Device for in-situ collection of a gaseous reaction product from a polishing slurry as a workpiece, such as a semiconductor wafer, is being polished with the slurry, including a probe capable of being placed in contact with the slurry, the probe having a channel for transmitting the gaseous reaction product to an analyzer, a first hydrophobic membrane for allowing passage of the gaseous reaction product from the slurry to the channel, and means for directing a carrier gas through the channel.

REFERENCES:
patent: 5317932 (1994-06-01), Westlake, III et al.
patent: 5442970 (1995-08-01), Hutchins
patent: 5448922 (1995-09-01), Kimbell et al.
patent: 5553484 (1996-09-01), Bender et al.

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