Printing of design features using alternating PSM technology...

Details Printing of design features using alternating PSM technology... Printing of design features using alternating PSM technology...

2005-10-18

2009-11-10

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C716S030000, C430S394000

Reexamination Certificate

active

07615318

ABSTRACT:
For cases where one edge of a design feature is to be printed through a shifter mask and another one is to be printed through a binary trim mask, and where no upsizing can be performed due to the local density of the design, it is proposed to add shifters with respect to the shifter mask in such a way that all the edges are printed by the phase shift mask.

REFERENCES:
patent: 6338922 (2002-01-01), Liebmann et al.
patent: 6675369 (2004-01-01), Lukanc et al.
patent: 6749970 (2004-06-01), Lukanc et al.
patent: 7229722 (2007-06-01), Liebmann et al.
patent: 2001/0000240 (2001-04-01), Wang et al.
patent: 2003/0162102 (2003-08-01), Pierrat

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