Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole
Reexamination Certificate
2005-10-03
2008-07-29
Culbert, Roberts (Department: 1792)
Etching a substrate: processes
Forming or treating electrical conductor article
Forming or treating of groove or through hole
C029S852000
Reexamination Certificate
active
07404908
ABSTRACT:
According to this manufacturing method, a copper foil is attached to both sides of an insulating material to form a substrate. First, a large number of through-holes is made in the substrate and the inside of the through-holes is made electrically conductive. Then, after one side of the substrate is coated with a photosensitive dry film having an outer masking layer attached thereto, a developing solution is caused to infiltrate into the through-bores from the other side to develop the photosensitive dry film as a plating resist. The photosensitive dry film is then exposed to be hardened. The outer masking layer is removed to copper-electroplate the inside of the through-holes and the like. Finally, the photosensitive dry film is removed to form a circuit pattern.
REFERENCES:
patent: 4889790 (1989-12-01), Roos et al.
patent: 06177505 (1994-06-01), None
patent: 11-195849 (1999-07-01), None
Culbert Roberts
Jordan and Hamburg LLP
Maruwa Corporation
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