Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1988-11-03
1990-04-24
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430280, 430287, 430313, 430324, 430275, G03C 516, G03C 194, G03C 500
Patent
active
049200380
ABSTRACT:
In order to achieve a low dielectric constant and in order to improve the constant temperature resistance of radiation-sensitive synthetic resin lacquers, a photo-polymer system which is composed of a furyl acrylic acid esterified epoxy resin with phenoxy or epoxy end groups is employed as coating (2, 13, 4) on a substrate in the manufacture of printed circuits, particularly in multi-layer format. The cross-linking ensues with light in the wavelength range from about 150 through 400 nm preferably in the presence of a sensitizer without any following hot-hardening. As a consequence of its good solubility, the product can be easily processed and requires no intermediate layers when in a multi-layer format. A further area of employment lies in the field of integrated semiconductor circuits in VLSI technology when producing negative photo-resists.
REFERENCES:
patent: 3922479 (1975-11-01), Older et al.
patent: 3996121 (1976-12-01), Green et al.
Budde Klaus
Melchior Walter
Nuyken Oskar
Hamilton Cynthia
Michl Paul R.
Siemens Aktiengesellschaft
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