Prevention of Ta2O5 mim cap shorting in the beol anneal cycles

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S315000, C438S253000

Reexamination Certificate

active

06940117

ABSTRACT:
The present invention provides a high-performance metal-insulator-metal (MIM) capacitor which contains a high-k dielectric, yet no substantial shorting of the MIM capacitor is observed. Specifically, shorting of the MIM capacitor is substantially prevented in the present invention by forming a passivation layer between the high-k dielectric layer and each of the capacitor's electrodes. The inventive MIM capacitor includes a first conductor; a first passivation layer located atop the first conductor; a high-k dielectric layer located atop the first passivation layer; a second passivation layer located atop the high k dielectric layer; and a second conductor located atop the second passivation layer.

REFERENCES:
patent: 6201276 (2001-03-01), Agarwal et al.
patent: 6271084 (2001-08-01), Tu et al.
patent: 6344964 (2002-02-01), Adler
patent: 6387775 (2002-05-01), Jang et al.
patent: 6426249 (2002-07-01), Geffken et al.
patent: 6638876 (2003-10-01), Levy et al.
patent: 2002/0022331 (2002-02-01), Saran

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