Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-06-02
2008-07-15
Kelly, Cynthia H. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S326000, C430S330000
Reexamination Certificate
active
07399572
ABSTRACT:
A pretreatment composition of:(a) at least one compound having structure VIin-line-formulae description="In-line Formulae" end="lead"?V1—Y—V2VIin-line-formulae description="In-line Formulae" end="tail"?wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, andeach R1is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2is independently H, SH, CH3, C2H5, and a linear or branched C1-C4alkyl group containing a thiol group; and wherein V1and V2are independently selected fromwherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y═n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1is defined as above;(b) at least one organic solvent, and optionally,(c) at least one adhesion promoter;wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
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Hopla Richard
Metivier N. Jon
Naiini Ahmad A.
Powell David B.
Rushkin Il'ya
Eoff Anca
Fish & Richardson P.C.
Fujifilm Electronic Materials U.S.A., Inc.
Kelly Cynthia H.
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