Pressure regulating system of plasma processing equipment

Details Pressure regulating system of plasma processing equipment Pressure regulating system of plasma processing equipment

2005-06-28

2005-06-28

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S715000, C118S728000, C118S050000, C156S345350, C156S345290, C156S345330, C156S345340, C156S345360

Reexamination Certificate

active

06910441

ABSTRACT:
Plasma processing equipment includes a process, a cover covering the top of the process chamber, a wafer chuck disposed in the process chamber, a pressure regulating system including a pressure regulating plate situated at the bottom surface of the cover, and an elevating mechanism for adjusting the position of the pressure regulating plate, and a measuring device including at least one visual display for use in calibrating the pressure regulating system.

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