Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-09-05
2010-02-23
Kik, Phallaka (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C700S120000, C700S121000
Reexamination Certificate
active
07669171
ABSTRACT:
A prediction model for exposure dose is indicated by the following formula, E=E0+EC, wherein E represents an optimized exposure dose, E0represents a preset exposure dose of a process control system, and ECrepresents an exposure dose compensation value, andin-line-formulae description="In-line Formulae" end="lead"?EC=[(MTTdiff/X)/(CDmask/X)]×(ES/A′)×(Wlast+Wavg),in-line-formulae description="In-line Formulae" end="tail"?wherein MTTdiffrepresents the differences between the MTT value of a previous lot and the MTT value of a next lot, CDmaskrepresents the actual critical dimension of the mask, X represents the magnification of the mask, ESrepresents the actual exposure dose of a previous lot, A′ represents an experimental value obtained from the results of different lots, Wlastrepresents the last batch of weights and Wavgrepresents an average weight, and CDmask, ES, A′, Wlastand Wavgare set parameters built into the process control system.
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Chen Chung-An
Chen Ju-Te
Huang Chi-Ching
Wu Wen-Tsung
Yen Shih-Ming
J.C. Patents
Kik Phallaka
United Miceoelectronics Corp.
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